Leveraging The Precision Of Ion Beam Milling Vs. Chemical Etching Of Thin Film Circuits
Source: SemiGen
This paper describes experiments conducted by SemiGen that examined the degree of variation in performance of an RF filter circuit design optimized for 12 GHz and 24 GHz. Each were produced via the two processes. It will also provide microwave/millimeter-wave circuit, component, and subsystem engineers a baseline for committing to an intended thin film process, and details the key advantages of uniformity and repeatability of ion beam milling, particularly at higher frequencies. Download the full paper for more information.
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